平面靶磁控溅射镀膜机
- 设备优势:克服阳极消失现象,减弱或消除靶的异常弧光放电
- 使用技术:中频磁控溅射
- 适用靶材:平面靶,李生靶,对靶等多种形式
- Overcome the phenomenon of anode disappearance, reduce or eliminate the abnormal arc discharge of target
- Technology : MF magnetron sputtering
- Plane target, cylindrical target, twin target, opposite target etc.